| FORM NO | APPLY TIME | EFFECTIVE TIME | STATUS | SUBJECT | VIEW |
| PDP-20211105-0002 | 2021-11-05 09:38:12 | 2021-11-24 09:55:08 | Termination | BCD-890-AA comparison between conventional Al interconnect and Cu-dual damascene |
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| PDP-20211105-0001 | 2021-11-05 08:00:47 | | Signing | YZA-567-AA the effect of native oxide on thin gate oxide integrity |
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| PDP-20211104-0001 | 2021-11-04 13:08:56 | | Signing | VWX-234-AC new process development and process integration of LCDD devices |
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| PDP-20211103-0002 | 2021-11-03 16:33:09 | | Signing | STU-901-AA photo coater and development cycletime enhancements for hight power product |
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| PDP-20211103-0001 | 2021-11-03 13:06:30 | | Signing | GHI-789 process Metal GATE enhancement for high voltage break down requirement |
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| PDP-20211102-0002 | 2021-11-02 11:07:03 | 2021-11-26 08:45:22 | Effective | PQR-678-AA CMP speed and time improve prevention over polishing miss operation |
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| PDP-20211102-0001 | 2021-11-02 10:45:04 | | Signing | DEF-456 process enhancement for custome mobile product requirement |
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| PDP-20211101-0003 | 2021-11-01 14:56:05 | 2021-11-23 15:31:07 | Termination | MNO-345-AB flatness enhancements for film thickness measurement improve |
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| PDP-20211101-0002 | 2021-11-01 11:57:21 | 2021-11-16 09:04:32 | Effective | JKL-012-AA oxidation layer enhancements for PCVD recipe update |
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| PDP-20211101-0001 | 2021-11-01 09:34:02 | 2021-11-18 14:14:43 | Effective | ABC-123-AB new process evaluate for ion implantation mis-operation recipe enhancement |
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