Product Development Process 產品開發流程
Form No.
PDP-20211103-0001
Workflow Chart
Subject
GHI-789 process Metal GATE enhancement for high voltage break down requirement
Apply Time
2021-11-03 13:06:30
End Time
Status
Signing
Evaluate
Scan
BIST
Function
DDR
SATA
PLL
PCIE
Display
TD
CB
Impact
Temp
Slot
Memory
Power
Clock
ALPG
BIB
HPBSC
HPB5B
LC1
George Washington : Metallization - Wiring.pdf
George Washington : Oxidation - Fabrication of oxide layers.pdf
George Washington : Oxidation - Film thickness measurement.pdf
George Washington : Oxidation - LOCOS process.pdf
George Washington : Oxidation - Overview.pdf
George Washington : Photolithography - Development and inspection.pdf
George Washington : Photolithography - Exposition methods.pdf
Process Engineer
Equipment
Furnace
PCVD
CMP
IMP
Coater
Scaner
Developer
DryEtching
WetStation
Scrubber
Product Engineer
Layer
GateOxide
Metal1
Metal2
CVD
WetStation
Copper
Scrubber
Photo
DryEtching
IMP