Product Development Process 產品開發流程
Form No.PDP-20211101-0001Workflow Chart
SubjectABC-123-AB new process evaluate for ion implantation mis-operation recipe enhancement
Apply Time2021-11-01 09:34:02End Time2021-11-18 14:14:43
StatusEffective
Evaluate
Impact
George Washington : Basic PECVD Plasma Processes.pdf
George Washington : Comparison-between-conventional-Al-interconnect-and-Cu-dual-damascene.png
Process Engineer
Equipment
John Adams : Deposition - Chemical vapor deposition.pdf
Thomas Jefferson : Deposition - Physical deposition methods.pdf
Thomas Jefferson : Deposition - Plasma.pdf
Product Engineer
Layer
James Monroe : Dry etching - Dry etch processes.pdf